10 Minute Dry Cycle 60 cc IPA per Cycle Particle Neutral Drying to 0.16

JST's "CLV" Dryer utilizes a patented, environmentally friendly, ultra clean technology for precision drying of silicon wafers, III-V Compound wafers,  glass substrates, disc drives, optic lenses and many other products. Precision drying is critical for maintaining the cleaning process. JST's CLV is a hybrid of two proven technologies: vacuum drying and isopropyl alcohol (IPA) drying. JST's CLV Dryer utilizing the best features of both in an effective closed loop process. Ultra clean vapor is remotely generated and thenintroduced into a sealed drying chamber. The closed loop system allows fresh IPA vapor to rinse the surface to be dried,  penetrating the surface areas and absorbing the moisture. A low pressure vacuum pulls any remaining moisture from the sealed chamber and away from the product being dried.    At the end of the drying cycle the chamber is backfilled with argon or nitrogen gas so that the cleaned, dried product is removed from a virtually inert atmosphere.

---

Options Charcoal Filter Color User Interface Panel Bulk Chemical Dispense     Safety Meets FM Requirements No Vapor Present during Load/Unload Sealed Vessel with Closed Loop Process Low Emissions (less than 1 lb per day) Indirect Heating of IPA CO2 Fire Suppression System Automated Lid with Safety Interlocks Meets NFPA Class I Div II     Drying Aplications Silicon Wafer III-Compound Wafer MEMS Glass Substrates Disc Drives Optics and more

Facility Requirements   Industrial Grade PLC Modular design for quick replacements and minimal down time Interactive Touch Screen Interface Alarm Indicator Screens for easy troubleshooting Multi-level Menu Design Flexible process adjustment Visual process flow during recipe operation Multi level security structure Independent CO2 Fire    Controls Industrial Grade PLC Modular design for quick replacements and minimal down time Interactive Touch Screen Interface Alarm Indicator Screens for easy troubleshooting Multi-level Menu Design Flexible process adjustment Visual process flow during recipe operation Multi level security structure Independent CO2 Fire Controller interlocked to master PLC control