|
|
10 Minute Dry Cycle
60 cc IPA per Cycle
Particle Neutral Drying to 0.16 |
|
JST's "CLV" Dryer utilizes a patented, environmentally friendly, ultra clean technology for precision drying of silicon wafers, III-V Compound wafers, glass substrates, disc drives, optic lenses and many other products.
Precision drying is critical for maintaining the cleaning process. JST's CLV is a hybrid of two proven technologies: vacuum drying and isopropyl alcohol (IPA) drying. JST's CLV Dryer utilizing the best features of both in an effective closed loop process. Ultra clean vapor is remotely generated and thenintroduced into a sealed drying chamber. The closed loop system allows fresh IPA vapor to rinse the surface to be dried, penetrating the surface areas and absorbing the moisture. A low pressure vacuum pulls any remaining moisture from the sealed chamber and away from the product being dried.
| At the end of the drying cycle the chamber is backfilled with argon or nitrogen gas so that the cleaned, dried product is removed from a virtually inert atmosphere. | |
